هدف القصدير الحديدي من أكسيد السترونتيوم، SrFe12O19

Strontium Iron Oxide Sputtering Target Description

The Strontium Iron Oxide Sputtering Target, SrFe12O19 is engineered to meet the high standards required for modern sputtering applications. Crafted with exceptional purity (≥99%), this target ensures consistent performance and reliable operation in processes such as thin film deposition. Its high melting point of 450 °C and density of 8.02 g/cm³ contribute to its suitability in environments demanding precise thermal management and structural integrity. Designed for versatility, the target is available as standard discs or can be customized to unique customer specifications, ensuring optimal compatibility with various sputtering systems.

Strontium Iron Oxide Sputtering Target Applications

· Thin Film Deposition: Ideal for creating uniform metallic, magnetic, or insulating thin films in semiconductor and microelectronic processes.
· Microelectronics: Used in the fabrication of integrated circuits where precision and reliability are critical.
· Optoelectronic Devices: Supports the development of displays, sensors, and photovoltaic cells by providing consistent material properties.
· Research & Development: Suitable for experimental sputtering applications where material performance and reproducibility are essential.

Strontium Iron Oxide Sputtering Target Packing

The sputtering targets are securely packaged to preserve their quality and integrity during storage and transit. Standard packaging includes protective containers designed to minimize contamination and mechanical damage. Customized packaging solutions are also available to meet specific customer requirements.

Frequently Asked Questions

Q: What is the exact composition of the sputtering target?
A: The composition is SrFe₁₂O₁₉.

Q: What shapes are available for this product?
A: The product is available in discs or can be custom-made to meet specific requirements.

Q: What is the purity level of the sputtering target?
A: The purity is maintained at ≥99%.

Q: What does the melting point of 450 °C imply for its applications?
A: The melting point indicates excellent thermal stability, making it ideal for high-temperature sputtering processes.

Q: How is the sputtering target packaged?
A: The targets are packaged in secure, protective containers, with customized packaging options available as per customer needs.