ست TargetCesium Fluoride (CsF) للطليق

Cesium Fluoride (CsF) Sputtering Target Description

The Cesium Fluoride (CsF) Sputtering Target is a high-performance material engineered for precision thin film deposition processes. Developed according to stringent industry standards, this target delivers exceptional purity (≥99%) and uniformity, ensuring optimal sputtering behavior in advanced coating and semiconductor applications. The target is available in standard disc shapes or as custom-made configurations to suit specific operational requirements. Its defined melting point of 682℃ and density of 4.64 g/cm³ support reliable processing and consistent performance across a wide temperature range.

Cesium Fluoride (CsF) Sputtering Target Applications

· Thin Film Deposition: Ideal for use in sputtering systems for semiconductor, optical, and electronic coating applications.
· Display Technologies: Utilized in the fabrication of advanced display panels and photovoltaic devices.
· Research and Development: Provides a reliable material for experimental thin film studies and process optimization in academic and industrial labs.
· Custom Device Manufacturing: Adaptable to the unique requirements of various high-precision manufacturing processes.

Cesium Fluoride (CsF) Sputtering Target Packing

Our Cesium Fluoride (CsF) Sputtering Targets are meticulously packaged to preserve material integrity during storage and transit. Products are vacuum-sealed and securely wrapped, ensuring that each unit arrives in pristine condition and ready for immediate use in manufacturing and research applications.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a solid material used as the source for thin film deposition in sputtering systems, where atoms are ejected from the target material to form a thin film on a substrate.

Q: What are the benefits of using Cesium Fluoride (CsF) as a sputtering target?
A: CsF sputtering targets offer high purity and uniform composition, which lead to consistent thin film deposition and excellent performance in specialized electronic and optical applications.

Q: How is the purity of the CsF sputtering target ensured?
A: The purity (≥99%) is achieved through advanced refining and quality control processes, ensuring that the material meets stringent industry standards for high-performance sputtering applications.

Q: Can the target shapes be customized?
A: Yes, while standard disc shapes are available, the CsF sputtering target can be custom-made to meet specific dimensional and design requirements.

Q: In which industries are CsF sputtering targets commonly used?
A: CsF sputtering targets are widely used in semiconductor manufacturing, thin film deposition for optical coatings, display technology, and various research applications requiring precise material deposition.