ستهدف السبيكة النحاسية والألمنيوم (Cu/Al) ST0083

Copper Aluminum (Cu/Al) Sputtering Target Description

Copper Aluminum (Cu/Al) Sputtering Target is engineered to deliver exceptional performance in specialized sputtering applications. Manufactured to rigorous purity standards (≥99%) using a Cu/Al composition, this target is customizable to meet specific industrial requirements. Its versatility makes it ideal for depositing thin metallic films and other coatings in the fabrication of semiconductors, electronics, and advanced machinery components. The product is available in disc shape or can be custom-made, ensuring compatibility with various sputtering systems.

Copper Aluminum (Cu/Al) Sputtering Target Applications

· Thin Film Deposition: Perfect for depositing high-quality metallic films used in semiconductor and electronic device manufacturing.
· Coating Technologies: Enhances wear resistance and performance in industrial machinery through precise coating applications.
· Advanced Electronics: Ideal for use in sputtering techniques that require high uniformity and consistency in film thickness.
· Research and Development: Supports experimental setups and prototype production in academic and industrial R&D labs.

Copper Aluminum (Cu/Al) Sputtering Target Packaging

Each Copper Aluminum (Cu/Al) Sputtering Target is carefully packaged to preserve its integrity during transport. Custom packaging options are available to meet the specific needs of different applications.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a material used in the sputtering process to deposit thin films or coatings onto substrates by ejecting atoms from the target material.

Q: How does the Cu/Al composition benefit sputtering applications?
A: The Cu/Al composition offers a combination of the excellent conductivity of copper and the lightweight characteristics of aluminum, which can be advantageous in certain thin film applications.

Q: Are the shapes of the sputtering targets customizable?
A: Yes, the targets are available in disc shapes or can be custom-made to meet specific sputtering system requirements.

Q: What purity level is associated with this product?
A: The Copper Aluminum (Cu/Al) Sputtering Target has a purity of ≥99%, ensuring high-quality performance in sensitive applications.

Q: Which industries can benefit from using this sputtering target?
A: Industries such as electronics, semiconductors, advanced manufacturing, and research laboratories can leverage the benefits of this high-performance sputtering target.